Facilities

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INESC Microsistemas e Nanotecnologias

INESC MN operates a 200 m² cleanroom (class 10/100 areas) and adjoining 200 m² grey area (class 10,000). The technology infrastructure includes an additional 170 m² area of laboratory space.

Cleanroom

Lithography

Deposition

Etching

The microfabrication lithography suite is equipped with a range of advanced techniques for precise patterning and device fabrication, from fast design and exposure optimization for pattern development to exposure of pre-production batches.

The techniques available comprise photo and electron beam lithography, from micrometer to nanoscale resolutions, using direct write or hard mask assisted exposure.

Resist coating and development processes ensure uniform application and precise development of a varied range of resists, integral to defining micro-scale features.

OUR EQUIPMENT

Laser writer Heidelberg Instruments DWLii +info

Direct write lithography system from Heidelberg Instruments, utilizing a Diode laser (λ =405 nm (h-line) / write lens NA= 0.85) capable of critical dimensions down to 0.8 um. System works with mask designs in DXF format. (UPGRADE financed by FCT within the National Re-Equipment Program)  

Mask aligner Karl Suss MA/BA6 +info

The SUSS MA/BA Gen4 series is a high-precision mask aligner designed for photolithography processes, offering versatile capabilities for both proximity and contact exposure modes. It supports various substrate sizes and materials, up to 200 mm wafer size, as well as different exposure wavelengths with excellent exposure uniformity. The system allows both top-side and back-side alignment.

The etching lab offers a range of advanced techniques for precise material removal and surface patterning (up to 200 mm wafers).

Dry etching systems include reactive ion etching (RIE) and ion beam etching (IBE), while wet etch processing is also available.

Additionally, tools for UV and oxygen plasma surface cleaning are available, including a plasma ashing equipment compatible with 200 mm wafer batches.

OUR EQUIPMENT

SPTS Omega ICP (RIE) +info

This system uses reactive ion etching to etch dielectrics and metals using fluorine and chlorine chemistry. It is design to process up to 200 mm diameter wafers. The samples processed on the equipment have an uniformity of +/- 2.5 %. The system has 8 gases available: Ar, CF4, SF6, HBr, Cl2, BCl3, O2 and H2.

The deposition suite is equipped with a comprehensive array of techniques for thin film deposition, supporting advanced material development and microfabrication applications.

Deposition systems include magnetron sputtering, ion beam deposition (IBD) and plasma-enhanced chemical vapor deposition (PECVD), including more than 29 sputter targets available simultaneously in the sputtering machines (single and multitarget configurations).

The machines enable deposition of thin films from 0.3 nm up to several micrometers, with good uniformities across (up to) 200mm wafer diameter. Several substrate sizes and thickness and type are possible (glass, silicon, flexible coatings).

OUR EQUIPMENT

Nordiko 3600 cluster tool (IBD) +info

Ion beam deposition of metals and dielectrics on up to 8 inch wafers. The system has 6 targets to deposit multilayer structures with precise and automatic control of film thickness. Typical structures are spin valves and tunnel junctions, read gap oxides, passivation layers. Base pressure 5x10-8 Torr.

Nordiko 8800 (Magnetron sputtering) +info

Multi-target magnetron deposition system (up to 8" wafers). Available 8 targets (e.g. CoFe, CoFeB, NiFe, MgO, MnPt, FeB, Cr, Co, Ru).

Oxford Plasma Pro 100 (PECVD) +info

Thin-film deposition system that uses plasma-enhanced chemical vapor deposition to achieve high-uniformity coatings (a-Si:H, SiO2, SiNx, a-Si,C:H) with precise control over film properties like stress, refractive index, and density. It features advanced plasma source options (RF and LF), supports temperatures up to 400°C, and accommodates various substrate sizes up to 200 mm wafer size.

The microfabrication lithography suite is equipped with a range of advanced techniques for precise patterning and device fabrication, from fast design and exposure optimization for pattern development to exposure of pre-production batches.

The techniques available comprise photo and electron beam lithography, from micrometer to nanoscale resolutions, using direct write or hard mask assisted exposure.

Resist coating and development processes ensure uniform application and precise development of a varied range of resists, integral to defining micro-scale features.

OUR EQUIPMENT

The etching lab offers a range of advanced techniques for precise material removal and surface patterning (up to 200 mm wafers).

Dry etching systems include reactive ion etching (RIE) and ion beam etching (IBE), while wet etch processing is also available.

Additionally, tools for UV and oxygen plasma surface cleaning are available, including a plasma ashing equipment compatible with 200 mm wafer batches.

OUR EQUIPMENT

SPTS Omega ICP (RIE) +info

This system uses reactive ion etching to etch dielectrics and metals using fluorine and chlorine chemistry. It is design to process up to 200 mm diameter wafers. The samples processed on the equipment have an uniformity of +/- 2.5 %. The system has 8 gases available: Ar, CF4, SF6, HBr, Cl2, BCl3, O2 and H2.

The deposition suite is equipped with a comprehensive array of techniques for thin film deposition, supporting advanced material development and microfabrication applications.

Deposition systems include magnetron sputtering, ion beam deposition (IBD) and plasma-enhanced chemical vapor deposition (PECVD), including more than 29 sputter targets available simultaneously in the sputtering machines (single and multitarget configurations).

The machines enable deposition of thin films from 0.3 nm up to several micrometers, with good uniformities across (up to) 200mm wafer diameter. Several substrate sizes and thickness and type are possible (glass, silicon, flexible coatings).

OUR EQUIPMENT

Nordiko 3600 cluster tool (IBD) +info

Ion beam deposition of metals and dielectrics on up to 8 inch wafers. The system has 6 targets to deposit multilayer structures with precise and automatic control of film thickness. Typical structures are spin valves and tunnel junctions, read gap oxides, passivation layers. Base pressure 5x10-8 Torr.

Nordiko 8800 (Magnetron sputtering) +info

Multi-target magnetron deposition system (up to 8" wafers). Available 8 targets (e.g. CoFe, CoFeB, NiFe, MgO, MnPt, FeB, Cr, Co, Ru).

Tools

Characterization

Micromachining

Microfluidics

Microelectronics

Photonics &
Optoelectronics

Bioanalytical

Our labs are equipped with a variety of characterization tools, from material deposition levels to microfabricated devices, supporting quality control of microfabrication processes as well as qualification of materials and devices for both fundamental research and industrial applications.

OUR EQUIPMENT

The optoelectronics lab is equipped for optoelectronic and micromechanical device characterization: a 500 MHz scalar network analyzer, a 1 GHz spectral analyzer, a 2-phase 100 kHz lock-in amplifier and two 1-phase 100 kHz lock-in amplifiers.

We have two picoammeters for low-speed, high sensitivity measurements. The lab also has a monochromator with reticles for 400-1600 nm optical measurements, a tungsten halogen and an arc-lamp light source.

The lab has optical tables, a large assortment of power supplies and optical accessories. Measurements can be performed in vacuum or at controlled pressures.

In the photonics lab we perform forward and inverse photonic design based on finite-difference time-domain and frequency-domain solvers to support the micro and nanofabrication of photonic devices, in particular, metasurfaces. The structured light laboratory enables device characterization (modal analysis decomposition of the shaped optical beams), comprising laser sources (visible and near-infrared), a reprogrammable spatial light modulator, cameras for beam detection, and a variety of optical and optomechanics components.

OUR EQUIPMENT

The microfluidics lab focuses its activities in the design, simulation, fabrication and test of microfluidic devices and organs-on-chip, including heterogeneous integration (different materials and thin film sensors/actuators microfabricated in-house).

Design and Simulation

• Multiphysics simulation
• Flow, sensor and actuator simulation
• CAD design, software masks and hardmasks

Prototyping and Fabrication

• Photolithography, soft-lithography (feature resolutions of 1 micron)
• Photoresist, elastomer & epoxy molding
• 3D CNC Micromilling & Microdrilling
• 3D Printing
• Hot embossing
• Laser cutting
• Xurography
• Lamination
• Solvent & Plasma bonding
• Chemical & physical surface wettability modification
• Micro/Nano structuring of surfaces
• Picoliter spotting

Materials

• Silicon, glass
• Elastomers (PDMS, Ecoflex, Flexdym)
• Thermoplastics (PMMA, PET, PS, COC)
• Metals
• Ceramics
• Epoxy glues

Characterization

• Microscopy (optical, SEM, AFM)
• Bioimaging, optical imaging
• Topography/roughness measurements
• Contact angle
• Magnetic, optical, thermal and electrical.

OUR EQUIPMENT

The lab supports assay development and testing of bioanalytes (e.g. nucleic acids, proteins, cells, toxins) in biosensors and platforms developed in-house, integrating microfluidic devices with sensors, actuators and electronics. Data measurement and metering are conducted with data acquisition stations, optical/fluorescence microscopy, and image acquisition systems.

Samples are metered/manipulated using pipettes (down to picoliters), microarraying, refrigerated centrifuges, incubators, mixers, and pH meters, as well as custom platforms.

Biochemical assays include thermal cyclers for nucleic acid amplification and an electrophoresis system.

We also have a class 2 biological safety cabinet, autoclave/UV equipment for supplies sterilization. Sample and reagent storage include standard fridge/freezer and an -80°C freezer.

OUR EQUIPMENT

The micromachining infrastructure specializes in a diverse array of fabrication and material processing techniques. Together, these techniques enable comprehensive micro-scale fabrication and prototyping.

It offers CNC milling for precision subtractive machining of component manufacturing and advanced surface preparation through grinding and polishing for various materials.

The lab supports precise laser cutting for custom designs, xurography for cutting thin films and sheets along with mechanical drilling for creating fine features. 3D printing provides additive manufacturing capabilities, enabling the creation of complex three-dimensional structures.

Additional techniques include, heat press transfer for applying coatings, screen printing for patterning materials and high shear mixing for preparing uniform material dispersions.

OUR EQUIPMENT

Technologies for post-processing of devices, from wafer level to encapsulation of individual chips. Moreover, the ASIC group focuses on developing architectures, circuits and signal processing algorithms for interfacing a variety of sensors produced in-house. In this scope INES MN is part of the INESC Lisbon Electronics Lab, where a variety of high precision IC characterization tools are available.

OUR EQUIPMENT

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OUR EQUIPMENT

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OUR EQUIPMENT

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OUR EQUIPMENT

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OUR EQUIPMENT

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OUR EQUIPMENT

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OUR EQUIPMENT

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OUR EQUIPMENT

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OUR EQUIPMENT

 

Our labs are equipped with a variety of characterization tools, from material deposition levels to microfabricated devices, supporting quality control of microfabrication processes as well as qualification of materials and devices for both fundamental research and industrial applications.

OUR EQUIPMENT

The micromachining infrastructure specializes in a diverse array of fabrication and material processing techniques. Together, these techniques enable comprehensive micro-scale fabrication and prototyping.

It offers CNC milling for precision subtractive machining of component manufacturing and advanced surface preparation through grinding and polishing for various materials.

The lab supports precise laser cutting for custom designs, xurography for cutting thin films and sheets along with mechanical drilling for creating fine features. 3D printing provides additive manufacturing capabilities, enabling the creation of complex three-dimensional structures.

Additional techniques include, heat press transfer for applying coatings, screen printing for patterning materials and high shear mixing for preparing uniform material dispersions.

OUR EQUIPMENT

The microfluidics lab focuses its activities in the design, simulation, fabrication and test of microfluidic devices and organs-on-chip, including heterogeneous integration (different materials and thin film sensors/actuators microfabricated in-house).

Design and Simulation

• Multiphysics simulation
• Flow, sensor and actuator simulation
• CAD design, software masks and hardmasks

Prototyping and Fabrication

• Photolithography, soft-lithography (feature resolutions of 1 micron)
• Photoresist, elastomer & epoxy molding
• 3D CNC Micromilling & Microdrilling
• 3D Printing
• Hot embossing
• Laser cutting
• Xurography
• Lamination
• Solvent & Plasma bonding
• Chemical & physical surface wettability modification
• Micro/Nano structuring of surfaces
• Picoliter spotting

Materials

• Silicon, glass
• Elastomers (PDMS, Ecoflex, Flexdym)
• Thermoplastics (PMMA, PET, PS, COC)
• Metals
• Ceramics
• Epoxy glues

Characterization

• Microscopy (optical, SEM, AFM)
• Bioimaging, optical imaging
• Topography/roughness measurements
• Contact angle
• Magnetic, optical, thermal and electrical.

OUR EQUIPMENT

 

The lab supports assay development and testing of bioanalytes (e.g. nucleic acids, proteins, cells, toxins) in biosensors and platforms developed in-house, integrating microfluidic devices with sensors, actuators and electronics. Data measurement and metering are conducted with data acquisition stations, optical/fluorescence microscopy, and image acquisition systems.

Samples are metered/manipulated using pipettes (down to picoliters), microarraying, refrigerated centrifuges, incubators, mixers, and pH meters, as well as custom platforms.

Biochemical assays include thermal cyclers for nucleic acid amplification and an electrophoresis system.

We also have a class 2 biological safety cabinet, autoclave/UV equipment for supplies sterilization. Sample and reagent storage include standard fridge/freezer and an -80°C freezer.

OUR EQUIPMENT

 

Technologies for post-processing of devices, from wafer level to encapsulation of individual chips. Moreover, the ASIC group focuses on developing architectures, circuits and signal processing algorithms for interfacing a variety of sensors produced in-house. In this scope INES MN is part of the INESC Lisbon Electronics Lab, where a variety of high precision IC characterization tools are available.

OUR EQUIPMENT

 

The optoelectronics lab is equipped for optoelectronic and micromechanical device characterization: a 500 MHz scalar network analyzer, a 1 GHz spectral analyzer, a 2-phase 100 kHz lock-in amplifier and two 1-phase 100 kHz lock-in amplifiers.

We have two picoammeters for low-speed, high sensitivity measurements. The lab also has a monochromator with reticles for 400-1600 nm optical measurements, a tungsten halogen and an arc-lamp light source.

The lab has optical tables, a large assortment of power supplies and optical accessories. Measurements can be performed in vacuum or at controlled pressures.

In the photonics lab we perform forward and inverse photonic design based on finite-difference time-domain and frequency-domain solvers to support the micro and nanofabrication of photonic devices, in particular, metasurfaces. The structured light laboratory enables device characterization (modal analysis decomposition of the shaped optical beams), comprising laser sources (visible and near-infrared), a reprogrammable spatial light modulator, cameras for beam detection, and a variety of optical and optomechanics components.

OUR EQUIPMENT

Microfluidics Lab

The microfluidics lab focuses its activities in the design, simulation, fabrication and test of microfluidic devices and organs-on-chip, including heterogeneous integration (different materials and thin film sensors/actuators microfabricated in-house).

Design and Simulation

Prototyping and Fabrication

Characterization

Materials

  • Multiphysics simulation
  • Flow, sensor and actuator simulation
  • CAD design, software masks and hardmasks
  • Photolithography, soft-lithography (feature resolutions of 1 micron)
  • Photoresist, elastomer & epoxy molding
  • 3D CNC Micromilling & Microdrilling
  • 3D Printing
  • Hot embossing
  •  Laser cutting
  • Xurography
  • Lamination
  • Solvent & Plasma bonding
  • Chemical & physical surface wettability modification
  • Micro/Nano structuring of surfaces
  • Picoliter spotting
  • Silicon, glass
  • Elastomers (PDMS, Ecoflex, Flexdym)
  • Thermoplastics (PMMA, PET, PS, COC)
  • Metals
  • Ceramics
  • Epoxy glues
  • Microscopy (optical, SEM, AFM)
  • Bioimaging, optical imaging
  • Topography/roughness measurements
  • Contact angle
  • Magnetic, optical, thermal and electrical

OUR EQUIPMENT

  • Multiphysics simulation
  • Flow, sensor and actuator simulation
  • CAD design, software masks and hardmasks
  • Photolithography, soft-lithography (feature resolutions of 1 micron)
  • Photoresist, elastomer & epoxy molding
  • 3D CNC Micromilling & Microdrilling
  • 3D Printing
  • Hot embossing
  • Laser cutting
  • Xurography
  • Lamination
  • Solvent & Plasma bonding
  • Chemical & physical surface wettability modification
  • Micro/Nano structuring of surfaces
  • Picoliter spotting
  • Silicon, glass
  • Elastomers (PDMS, Ecoflex, Flexdym)
  • Thermoplastics (PMMA, PET, PS, COC)
  • Metals
  • Ceramics
  • Epoxy glues
  • Microscopy (optical, SEM, AFM)
  • Bioimaging, optical imaging
  • Topography/roughness measurements
  • Contact angle
  • Magnetic, optical, thermal and electrical.

OUR EQUIPMENT

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