The Thin film Expert group from EuroNanolab met in Toulouse on October 15–16 for a two-day workshop to discuss CVD and ALD methods. The group also visited the LAAS-CNRS cleanroom and enjoyed discussions near the deposition, etching and lithography tools.
The thin film expert group is coordinated by Pascal Dubreuil (LAAS/CNRS), Susana Cardoso de Freitas (INESC MN) and Matias Trujillo (NTNU).